IdN v28n1: Pattern Making & Design

US$25.90

Just Keep On Going!
Regularity and consistency are crucial factors for any pattern design. Our world is filled with all kinds of patterns: you can find them in Nature, including symmetries, trees and other structures with a fractal dimension, spirals, meanders, waves, foams, tilings, cracks and stripes.

In this issue, we feature 39 designers who are maestros of pattern design. Although each have their own individual design approach and execution plan, they share similar opinions on what makes a good pattern. To be eye-catching is a must. And though each reflects its creator’s personal style, an harmonious composition is common to most. On top of that, the pattern should be applicable in various mediums, some being developed as part of an overall identity system. We ask these creatives to share their thoughts on what they think the future trend for pattern design might be.

SKU: v28n1 Category:

Description

Pattern Making & Design
Taking the pattern theme a step further, have a look at yourself — the clothes you are wearing, the bag you are carrying, the make-up you put on — all involve certain pattern essentials. The more attention you pay to your surroundings, and the more things you interact with, the more surprised you are likely to be at the number of patterns we come across on a daily basis.

High-end fashion brands are noted for their monograms, a rather simplistic form of pattern, mostly consisting of only two elements, a logo and various shapes or forms that by repeating themselves become a pattern, which tends to develop as part of their identity system.

Regularity and consistency lead to prediction, and the trend of patterns seems to be gradually evolving, with many elements being added and fewer monogram-type patterns being made.

Featuring:
Ada Zielińska | AguWu | Alexey Boychenko | Anna Gugutishvili | Antlii (Anatolii Babii) | Arthur-Louis Ignoré | Artsy Kiddo | Asuka Watanabe | Carla Cabras Design | Catherine Pearson | Dialogue Design Studio | Estúdio Daó | Genis Carreras | Geraldine Karnadi | hup studio | In-House | Irene Demetri (Youandigraphics) | Iuliia Mazur (Softulka) | Ivan Kamzyst (Vanzyst) | Javier de Riba | Kenneth Kuh | Léo Alexandre | Long & Short | Lorena G | Maud Vantours | Mehman Mammadov | Mohamed Samir | Monga Design | Muti | Nick Barclay Designs | Okuda San Miguel | Rachit (Designerachit) | Ray Dak Lam | Rick Jordens | Tanja Hildebrandt | Team Thursday | Vratislav Pecka (PosterLad) | Wade and Leta | Zekia Studio (Gowshika Ravi)

Specifications:
160p + 8p cover
160mm (w) x 230mm (h)
4 varying paper stocks
4C process + matt lamination
ISSN (English Edition): 1029 4805
ISSN (Chinese Edition): 1029 4813

Additional information

Weight 410 g
Edition

Chinese, English